Inquiry (采购产品): Request for Quoation for PECVD Dear Sir, I would be grateful if you can send me a quotation for a plasma enhanced chemical vapor deposition system with the following specifications: 1. Capable of handling upto 8” wafers. 2. Pressure range from 0.1 Torr to 2 Torr. 3. Suitable for depositing low stress nitrides, oxides, silicon, silicon germanium and silicon carbide. 4. Temperature range between 200?C till 800?C (wafer temperature). 5. Allow in situ doping using diborane, phosphine and arcsine. 6. This system handles one wafer at a time. With my kind regards, Sherif Sedky. Dr. Sherif Sedky Professor Physics Department The American University in Cairo 113 Kasr El Eini Street P.O.Box 2511 Cairo 11511, Egypt Office: + 202 2797 5902 Fax: + 202 2795 7565 Cell: + 20 10 199 64 89 **** Hidden Message ***** Sherif sedky 113 kaser El Eini Street Cairo11511 EGY Company: The American University in Cairo Title: Professor Phone: +20 10 199 64 89 E-mail: sedky@aucegypt.edu **** Hidden Message ***** sedky@aucegypt.edu
